Rchr
J-GLOBAL ID：200901079098356090
Update date: May. 08, 2020
PARK Kyung-ho
パク キョンホ | PARK Kyung-ho
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Affiliation and department：
National Institute of Advanced Industrial Science and Technology
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Homepage URL (1)：
http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=K31705569
MISC (1)：
T Saito, KH Park, K Hirama, U Umezawa, M Satoh, H Kawarada, H Okushi. Fabrication of diamond MISFET with micron-sized gate length on boron-doped (111) surface. DIAMOND AND RELATED MATERIALS. 2005. 14. 11-12. 2043-2046
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