Rchr
J-GLOBAL ID：200901080967003249
Update date: Aug. 27, 2020
Fujii Kanenaga
フジイ カネナガ | Fujii Kanenaga
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Affiliation and department：
National Institute of Advanced Industrial Science and Technology
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MISC (4)：
K. Fujii, Y. Horino, N. Tsubouchi, B. Enders, A. Chayahara, A. Kinomura. Ion-beam deposition with positive and negative ions. Surface and Coatings Technology. 1996. 84. 1-3. 544-549
K. Fujii, Y. Horino, N. Tsubouchi, B. Enders, A. Chayahara, A. Kinomura. Ion-beam deposition with positive and negative ions. Surface and Coatings Technology. 1996. 84. 1-3. 544-549
Simulaneous Mass-Analyzed Positive and Negative low-Energy Ion Beam Deposition Apparatus. Nucl. Instr. and Meth., (1996) (in printing)
Simulaneous Mass-Analyzed Positive and Negative low-Energy Ion Beam Deposition Apparatus. Nucl. Instr. and Meth., (1996) (in printing)
Association Membership(s) (1)：
The Japan Society of Applied Physics
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