Rchr
J-GLOBAL ID:200901090626309485   Update date: Jan. 30, 2024

Tanaka Yasunori

タナカ ヤスノリ | Tanaka Yasunori
Affiliation and department:
Job title: Deputy Director
Homepage URL  (1): http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=Y72950186
Research field  (2): Inorganic materials ,  Semiconductors, optical and atomic physics
Research theme for competitive and other funds  (4):
  • 2015 - 2018 Pulse power application of SiC power devices with ultra-low loss and high switching speed
  • 2012 - 2015 A new opwerating mode of SiC-buried gate static induction transistor with untra-low on-resistance
  • 2009 - 2011 Improvement in th e reli ability of super low power loss SiC static induction devices
  • 2006 - 2008 Research on the maximum performance of silicon carbide static induction devices
Papers (61):
  • Norimichi Chinone, Alpana Nayak, Ryoji Kosugi, Yasunori Tanaka, Shinsuke Harada, Hajime Okumura, Yasuo Cho. Evaluation of silicon- and carbon-face SiO2/SiC MOS interface quality based on scanning nonlinear dielectric microscopy. APPLIED PHYSICS LETTERS. 2017. 111. 6
  • T. Miyazaki, T. Makino, A. Takeyama, S. Onoda, T. Ohshima, Y. Tanaka, M. Kandori, T. Yoshie, Y. Hijikata. Effect of gamma-ray irradiation on the device process-induced defects in 4H-SiC epilayers. Superlattices and Microstructures. 2016. 99. 197-201
  • N. Chinone, R. Kosugi, Y. Tanaka, S. Harada, H. Okumura, Y. Cho. Local deep level transient spectroscopy using super-higher-order scanning nonlinear dielectric microscopy. MICROELECTRONICS RELIABILITY. 2016. 64. 566-569
  • Takahito Kojima, Shinsuke Harada, Yusuke Kobayashi, Mitsuru Sometani, Keiko Ariyoshi, Junji Senzaki, Manabu Takei, Yasunori Tanaka, Hajime Okumura. Self-aligned formation of the trench bottom shielding region in 4H-SiC trench gate MOSFET. JAPANESE JOURNAL OF APPLIED PHYSICS. 2016. 55. 4
  • Shinsuke Harada, Yusuke Kobayashi, Keiko Ariyoshi, Takahito Kojima, Junji Senzaki, Yasunori Tanaka, Hajime Okumura. 3.3-kV-Class 4H-SiC MeV-Implanted UMOSFET With Reduced Gate Oxide Field. IEEE ELECTRON DEVICE LETTERS. 2016. 37. 3. 314-316
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MISC (17):
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