Hasumi Masahiko

Affiliation and department：
Job title： Assistant Professor
Other affiliations (2)：

Tokyo University of Agriculture and Technology Faculty of Engineering, Department of Electrical and Electronic Engineering
Tokyo University of Agriculture and Technology Graduate School of Engineering, Department of Electrical and Electronic Engineering

Homepage URL (1)： http://www.tuat.ac.jp/~sameken/

Research field (2)： Electronic devices and equipment , Electric/electronic material engineering

Research theme for competitive and other funds (7)：

2022 - 2025 PN接合の内蔵電位を考慮した少数キャリア再結合速度の解析
2016 - 2018 マイクロ波急速加熱による薄膜シリコン結晶形成技術の開発
2013 - 2016 study on high efficiency solar cell driven by metal workfunction
2011 - 2013 結晶シリコンソーラーセルの水蒸気熱処理による特性改善機構の解明
2010 - 2012 Observation of defects induced by non thermal equilibrium processes and their control used by microwave absorption of free carriers

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Papers (107)：

Hiromasa Shimizu, Kota Shinohara, Masahiko Hasumi. Improvement of photothermal heating efficiency of Si plasmonic waveguide heaters with ring resonators. Japanese Journal of Applied Physics. 2024. 63. 5. 052004-052004
Masahiko Hasumi, Toshiyuki Sameshima, Tomohisa Mizuno. Passivation of cut edges of crystalline silicon by heat treatment in liquid water. Japanese Journal of Applied Physics. 2023. 62. SK. SK1022-SK1022
Nana Ota, Kota Shinohara, Masahiko Hasumi, Hiromasa Shimizu. Quantification of 288 K local photothermal heating and miniaturization in Si plasmonic waveguides integrated with resonators. Japanese Journal of Applied Physics. 2023. 62. 4. 042002-042002
Tomoyoshi Miyazaki, Ryota Seki, Takuma Uehara, Takuji Arima, Masahiko Hasumi, Go Kobayashi, Izumi Serizawa, Toshiyuki Sameshima. Development of Microwave-Induced Rapid Heating System Using Wireless Carbon Heating Tubes. Proceedings of AM-FPD 2020 - 27th International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials. 2020. 7-10
Toshiyuki Sameshima, Tomokazu Nagao, Erika Sekiguchi, Masahiko Hasumi. Argon Precursor Ion Implantation Used to Activate Boron Atoms in Silicon at Low Temperatures. IEEE ACCESS. 2020. 8. 72598-72606

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MISC (78)：

宮崎智由, 宮崎智由, 鮫島俊之, 齋藤宗平, 小野寺航, 上原琢磨, 有馬卓司, 蓮見真彦, 小林剛, 芹澤和泉, et al. Activation of Phosphorus Implanted Silicon Substrate with a Diameter of 300 mm by a Heating System using a Wireless Lamp as the Heat Source. 電子情報通信学会論文誌 C(Web). 2023. J106-C. 1
Masahiko Hasumi, Toshiyuki Sameshima, Ryota Seki, Takuma Uehara, Takuji Arima, Tomoyoshi Miyazaki, Go Kobayashi, Izumi Serizawa. Activation of Dopant Atoms in Silicon by Microwave-Induced Rapid Heating with Wireless Carbon Heating Tubes. Extended Abstracts of the 2020 International Conference on Solid State Devices and Materials. 2020. 409-410
Toshiyuki Sameshima, Masahiko Hasumi, Tomohisa Mizuno. Non-Destructive 9.35GHz Microwave Sensing System for Investigating Electrical Properties of Silicon. Extended Abstracts of the 2020 International Conference on Solid State Devices and Materials. 2020. 407-408
竹根澤潤, 蓮見真彦, 鮫島俊之, 金子哲也, 鯉田崇, 柄澤稔, 近藤道雄. 透明導電性接着剤を用いた多接合ソーラーセル. 応用物理学会学術講演会講演予稿集(CD-ROM). 2010. 71st. ROMBUNNO.15A-ZB-10
T. Sameshima, M.Shimokawa, J.Takenezawa, T.Nagao M.Hasumi, S.Yoshidomi, N.Sano, T.Mizuno. Analysis of Microwave Absorption by Photo-Induced Carriers at PN Junction Formed by Ion Implantation. Proceedings of 6th Thin Film Materials and Devices Meeting. 2010. 100228115. 1-6

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Lectures and oral presentations (204)：

Fabrication of Polycrystalline Silicon Thin Films at 300oC Using Dehydrogenation by Argon Ion Implantation
(The 24th International Meeting on Information Display 2024)
Excimer-Laser-Induced Crystallization of Amorphous Silicon Films deposited at 300oC Using Dehydrogenation by Argon Ion Implantation at 25 and 300oC
(THE 31st INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES 2024)
2枚の導体板による2.45 GHzマイクロ波の完全吸収と発熱特性
(第20回薄膜材料デバイス研究会 2023)
マイクロ波透過測定を用いたイオン注入不純物活性化の非破壊評価
(第20回薄膜材料デバイス研究会 2023)
アルミニウムを用いた表面プラズモン共鳴センサと酸化グラフェン塗布によるサリチル酸メチルガスの選択的検出
(第84回応用物理学会秋季学術講演会 2023)

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Education (3)：

Professional career (1)：

Work history (3)：

Association Membership(s) (2)：

応用物理学会 , 日本物理学会

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