Rchr
J-GLOBAL ID：200901099315820868
Update date: Aug. 28, 2020
Okaniwa Mamoru
オカニワ マモル | Okaniwa Mamoru
Affiliation and department：
Job title：
大学院生(博士課程)
Research field (1)：
Electric/electronic material engineering
Research keywords (2)：
強誘電体薄膜
, Ferroelectric thin film
Research theme for competitive and other funds (2)：
- 2002 - 2004 強誘電体薄膜の低温成長
- 2002 - 2004 Low temperature growth of ferroelectric thin film
MISC (8)：
-
MOCVD法によりCurie温度前後で成膜したPb(Zr,Ti)O3薄膜の特性評価. 応用物理学関係連合講演会. 2003. 600
-
MOCVD法によるPb(Zr,Ti)O3薄膜の低温成長と特性の改善. 電子情報通信学会技術研究報告. 2003. 1-6
-
M Shimizu, M Okaniwa, H Fujisawa, H Niu. Crystalline and ferroelectric properties of Pb(Zr, Ti)O-3 thin films grown by low-temperature metalorganic chemical vapor deposition. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 2002. 41. 11B. 6686-6689
-
Masaru Shimizu, Mamoru Okaniwa, Hironori Fujisawa, Hirohiko Niu. Crystalline and ferroelectric properties of Pb(Zr, Ti)O3 thin films grown by low-temperature metalorganic chemical vapor deposition. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 2002. 41. 11 B. 6686-6689
-
Masaru Shimizu, Mamoru Okaniwa, Hironori Fujisawa, Hirohiko Niu. Low temperature growth of Pb(Zr,Ti)O3 thin films by two step MOCVD using seeds. Ferroelectrics. 2002. 271. 217-222
ｍore...
Education (4)：
- - 2003 Himeji Institute of Technology
- - 2003 Himeji Institute of Technology Graduate School, Division of Engineering Electrical Engineering and Computer Sciences
- - 2001 Himeji Institute of Technology
- - 2001 Himeji Institute of Technology Faculty of Engineering
Professional career (1)：
Association Membership(s) (2)：
Return to Previous Page
