Futamura Shigeru

フタムラシゲル | Futamura Shigeru

Affiliation and department：
Job title： Group Leader
Homepage URL (1)： http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=S49359752

Research field (2)： Basic plasma science , Applied plasma science

Research theme for competitive and other funds (2)：

2002 - 2004 フッ素系温暖化物質の回収・分解技術に関する研究
1993 - Research on Application of Nonthermal Plasma

MISC (63)：

S Futamura, H Kabashima, G Annadurai. Roles of CO2 and H2O as oxidants in the plasma reforming of aliphatic hydrocarbons. CATALYSIS TODAY. 2006. 115. 1-4. 211-216
Hyun-Ha Kim, Atsushi Ogata, Shigeru Futamura. Effect of different catalysts on the decomposition of VOCS using flow-type plasma-driven catalysis. IEEE TRANSACTIONS ON PLASMA SCIENCE. 2006. 34. 3. 984-995
SM Oh, HH Kim, H Einaga, A Ogata, S Futamura, DW Park. Zeolite-combined plasma reactor for decomposition of toluene. THIN SOLID FILMS. 2006. 506. 507. 418-422
A Ogata, HH Kim, SM Oh, S Futamura. Evidence for direct activation of solid surface by plasma discharge on CFC decomposition. THIN SOLID FILMS. 2006. 506. 507. 373-377
Effect of VOC Mixing on Energy Efficiency and Byproduct Distribution in VOC Decomposition with Nonthermal Plasma. Proceedings of the ESA/IEEE-IAS-EPC/IEJ/SFE Joint Conference on Electrostatics 2006. 2006. 921-928

ｍore...

Patents (3)：

Method of Treating Resin Materials to Yield Oils
樹脂材の油化処理方法
脂肪族アミンからの水素の回収方法

Education (4)：

- 1982 The University of Tokyo
- 1982 The University of Tokyo Graduate School, Division of Engineering Organic Photochemistry
- 1977 The University of Tokyo The Faculty of Engineering
- 1977 The University of Tokyo Faculty of Engineering Department of Reaction Chemistry

Professional career (1)：

Ph.D. (The University of Tokyo)

Awards (2)：

2002 - 米国電気・電子工学会 James Melcher Award (論文賞)
2002 - IEEE-IAS James Melcher Award (Paper Prize)

Association Membership(s) (6)：

The Japan Institute of Energy , The Japan Petroleum Institute , The Institute of Electrostatics Japan , The Chemical Society of Japan , American Chemical Society , IEEE

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