Hybrid Films Formed from Hexamethyldisiloxane and SiO by Plasma Process.

KASHIWAGI K; YOSHIDA Y; MURAYAMA Y

Art

J-GLOBAL ID：200902014759440580 Reference number：91A0791915

Hybrid Films Formed from Hexamethyldisiloxane and SiO by Plasma Process.

プラズマ処理によりヘキサメチルジシロキサンとSiOとから作製したハイブリッド膜

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Author (3)： , ,
Material：
Volume： 30 Issue： 8 Page： 1803-1807 Publication year： Aug. 1991
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Thin films of organic compounds , Structure and morphology of polymer solids

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