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J-GLOBAL ID：200902016198143087   Reference number：83A0482785

Local bonding of oxygen and hydrogen in a-Si:H:O thin films.

a-Si:H:O薄膜における酸素と水素の局所結合
Author (2)：
LUCOVSKY G

About LUCOVSKY G

(North Carolina State Univ.)

About North Carolina State Univ.

, 
POLLARD W B

About POLLARD W B

(North Carolina State Univ.)

About North Carolina State Univ.


Material：
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films  (Journal of Vacuum Science and Technology. A. Vacuum, Surfaces, and Films)

About Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films


Volume： 1  Issue： 2 Pt 1  Page： 313-316  Publication year： Apr. 1983 
JST Material Number： C0789B  ISSN： 0734-2101  CODEN： JVTAD6  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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silicon

About silicon

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Vibrational states in disordered systems 
(BL03040V)

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,  Infrared spectra,Raman scattering and Raman spectra of inorganic compounds 
(BM08063C)

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Terms in the title (4)：
Terms in the title
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Si

About Si

, 
薄膜

About 薄膜

, 
酸素

About 酸素

, 
水素

About 水素


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