Art
J-GLOBAL ID：200902017712958253   Reference number：90A0853239

Surface cleaning by electrostatic removal of particles.

粒子の静電除去による表面の清浄化
Author (4)：
COOPER D W

About COOPER D W

(IBM Research Division, NY)

About IBM Research Division, NY

, 
WOLFE H L

About WOLFE H L

(IBM Research Division, NY)

About IBM Research Division, NY

, 
YEH J T C

About YEH J T C

(IBM Research Division, NY)

About IBM Research Division, NY

, 
MILLER R J

About MILLER R J

(IBM Research Division, NY)

About IBM Research Division, NY


Material：
Aerosol Science and Technology  (Aerosol Sci Technol)

About Aerosol Science and Technology


Volume： 13  Issue： 1  Page： 116-123  Publication year： Jul. 1990 
JST Material Number： H0030B  ISSN： 0278-6826  CODEN： ASTYDQ  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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wafer

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,...
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JST classification (1)：
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Manufacturing technology of solid-state devices 
(NC03030V)

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清浄化

About 清浄化


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