Art
J-GLOBAL ID：200902034269126640   Reference number：92A0277167

Dynamic Observations of Interface Propagation during Silicon Oxidation.

シリコン酸化中における界面伝搬の動的観察
Author (2)：
ROSS F M

About ROSS F M

(AT&T Bell Lab., New Jersey)

About AT&T Bell Lab., New Jersey

, 
GIBSON J M

About GIBSON J M

(AT&T Bell Lab., New Jersey)

About AT&T Bell Lab., New Jersey


Material：
Physical Review Letters  (Phys Rev Lett)

About Physical Review Letters


Volume： 68  Issue： 11  Page： 1782-1785  Publication year： Mar. 16, 1992 
JST Material Number： H0070A  ISSN： 0031-9007  CODEN： PRLTAO  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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silicon

About silicon

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

,  Surface structure of semiconductors 
(BK15030A)

About Surface structure of semiconductors

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
シリコン

About シリコン

, 
酸化

About 酸化

, 
界面

About 界面

, 
伝搬

About 伝搬

, 
観察

About 観察


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