Chemical vapor deposition of copper from 1,5-cyclooctadiene copper(I) hexafluoroacetylacetonate.

REYNOLDS S K; SMART C J; BARAN E F; BAUM T H; LARSON C E; BROCK P J

Art

J-GLOBAL ID：200902039363386240 Reference number：91A0947453

Chemical vapor deposition of copper from 1,5-cyclooctadiene copper(I) hexafluoroacetylacetonate.

1,5-シクロオクタジエン銅(I)ヘキサフルオロアセチルアセトネートによる銅の化学蒸着

Publisher site Copy service {{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=91A0947453&COPY=1") }}
Access JDreamⅢ for advanced search and analysis. {{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=91A0947453&from=J-GLOBAL&jstjournalNo=H0613A") }}

Author (6)： , , , , ,
Material：
Volume： 59 Issue： 18 Page： 2332-2334 Publication year： Oct. 28, 1991
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

,...
,...

To see more with JDream III (charged). {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=91A0947453&from=J-GLOBAL&jstjournalNo=H0613A") }}

Metallic thin films

Return to Previous Page