Art
J-GLOBAL ID：200902039456835665   Reference number：89A0104791

Photoresist materials for microlithography.

微細光加工とフォトレジスト材料
Author (1)：
YAMAOKA TSUGUO

About YAMAOKA TSUGUO

(千葉大 工)

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Material：
日本写真学会誌  (日本写真学会会誌)

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Volume： 51  Issue： 6  Page： 475-489  Publication year： Dec. 1988 
JST Material Number： G0165A  ISSN： 0369-5662  CODEN： NSGKAP  Document type： Article
Article type： 解説  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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photoresist

About photoresist

,...
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Thesaurus term/Semi thesaurus term
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cyclized rubber

About cyclized rubber

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Various photographies 
(ZA03040M)

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,  Other reactions of polymer 
(CG03040H)

About Other reactions of polymer

Reference (64)：
  • 1) L. M. Minsk, J. G. Smith, W. P. Van Deusen, J. F. Wricht, J. Appl. Polym. Sci., 2, 302 (1957)
  • 2) E. Kodak, USP 2852379 (1958)
  • E. Kodak, USP 2940853 (1960)
  • 3) P. R. West, B. F. Griffing, Proc. SPIE, 394, 33 (1983)
  • 4) 特開昭59-104642 (GE)
ｍore...
Terms in the title (2)：
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フォト

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, 
レジスト材料

About レジスト材料


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