Art
J-GLOBAL ID：200902039456835665   Reference number：89A0104791

Photoresist materials for microlithography.

微細光加工とフォトレジスト材料
Author (1)：
YAMAOKA TSUGUO

About YAMAOKA TSUGUO

(千葉大 工)

About 千葉大 工


Material：
日本写真学会誌  (日本写真学会会誌)

About 日本写真学会誌


Volume： 51  Issue： 6  Page： 475-489  Publication year： Dec. 1988 
JST Material Number： G0165A  ISSN： 0369-5662  CODEN： NSGKAP  Document type： Article
Article type： 解説  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
photoresist

About photoresist

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
dihydronaphthalenes

About dihydronaphthalenes

,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=89A0104791&from=J-GLOBAL&jstjournalNo=G0165A") }}
JST classification (2)：
JST classification
Category name(code) classified by JST.
Various photographies 
(ZA03040M)

About Various photographies

,  Other reactions of polymer 
(CG03040H)

About Other reactions of polymer

Reference (64)：
  • 1) L. M. Minsk, J. G. Smith, W. P. Van Deusen, J. F. Wricht, J. Appl. Polym. Sci., 2, 302 (1957)
  • 2) E. Kodak, USP 2852379 (1958)
  • E. Kodak, USP 2940853 (1960)
  • 3) P. R. West, B. F. Griffing, Proc. SPIE, 394, 33 (1983)
  • 4) 特開昭59-104642 (GE)
ｍore...
Terms in the title (2)：
Terms in the title
Keywords automatically extracted from the title.
フォト

About フォト

, 
レジスト材料

About レジスト材料


Return to Previous Page

TOP

BOTTOM