Art
J-GLOBAL ID：200902048517803388   Reference number：89A0596319

X-ray determination of the residual stresses in thin aluminum films deposited on silicon substrates.

シリコン基板上に蒸着したアルミニウム薄膜における残留応力のX線による決定
Author (2)：
KORHONEN M A

About KORHONEN M A

(Helsinki Univ. Technology, Espoo, FIN)

About Helsinki Univ. Technology, Espoo, FIN

, 
PASZKIET C A

About PASZKIET C A

(Cornell Univ., New York)

About Cornell Univ., New York


Material：
Scripta Metallurgica  (Scr Metall)

About Scripta Metallurgica


Volume： 23  Issue： 8  Page： 1449-1453  Publication year： Aug. 1989 
JST Material Number： B0915A  ISSN： 0036-9748  CODEN： SCRMBU  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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aluminum

About aluminum

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Metallic thin films 
(BK14030T)

About Metallic thin films

,  Mechanical properties of metals 
(BL01022T)

About Mechanical properties of metals

Terms in the title (6)：
Terms in the title
Keywords automatically extracted from the title.
シリコン基板

About シリコン基板

, 
蒸着

About 蒸着

, 
アルミニウム

About アルミニウム

, 
薄膜

About 薄膜

, 
残留応力

About 残留応力

, 
X線

About X線


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