Solid state reactions and diffusion processes in metal-Si<sub>3</sub>N<sub>4</sub>-Si thin film systems-a comparison between Cr, Co and Ni metals.

EDELMAN F; GUTMANAS E Y; BRENER R

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J-GLOBAL ID：200902049244573941 Reference number：91A0023272

Solid state reactions and diffusion processes in metal-Si₃N₄-Si thin film systems-a comparison between Cr, Co and Ni metals.

金属-Si₃N₄-Si薄膜系における固体反応および拡散過程 Cr,CoおよびNi金属間の比較

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Volume： 41 Issue： 4/6 Page： 1268-1271 Publication year： 1990
JST Material Number： E0347A ISSN： 0042-207X Document type： Article
Article type：原著論文 Country of issue： United Kingdom (GBR) Language： ENGLISH (EN)

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半導体-金属接触【’81~’92】 , Thin films of other inorganic compounds , Diffusion in solids in general

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Solid state reactions and diffusion processes in metal-Si3N4-Si thin film systems-a comparison between Cr, Co and Ni metals.

Solid state reactions and diffusion processes in metal-Si₃N₄-Si thin film systems-a comparison between Cr, Co and Ni metals.