Art
J-GLOBAL ID：200902056613269026   Reference number：90A0720999

Effect of surface roughening on secondary ion yields and erosion rates of silicon subject to oblique oxygen bombardment.

斜め酸素衝撃にさらしたシリコンの二次イオン収量とエロージョン速度に対する表面粗さの効果
Author (1)：
WITTMAACK K

About WITTMAACK K

(Perkin Elmer Surface Science GmbH, Oberschleissheim, DEU)

About Perkin Elmer Surface Science GmbH, Oberschleissheim, DEU


Material：
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films  (Journal of Vacuum Science and Technology. A. Vacuum, Surfaces, and Films)

About Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films


Volume： 8  Issue： 3 Pt.2  Page： 2246-2250  Publication year： May. 1990 
JST Material Number： C0789B  ISSN： 0734-2101  CODEN： JVTAD6  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
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ion irradiation

About ion irradiation

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
erosion

About erosion


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JST classification (1)：
JST classification
Category name(code) classified by JST.
Irradiational changes semiconductors 
(BK16123E)

About Irradiational changes semiconductors

Terms in the title (7)：
Terms in the title
Keywords automatically extracted from the title.
酸素

About 酸素

, 
衝撃

About 衝撃

, 
シリコン

About シリコン

, 
二次イオン

About 二次イオン

, 
収量

About 収量

, 
エロージョン

About エロージョン

, 
表面粗さ

About 表面粗さ


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