Diamondlike carbon film deposition using a reactive pulsed electromagnetic inductive plasma process.

EBIHARA K; IKEGAMI T; MATSUMOTO T; NISHIMOTO H; MAEDA S; HARADA K

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J-GLOBAL ID：200902065172065186 Reference number：90A0118736

Diamondlike carbon film deposition using a reactive pulsed electromagnetic inductive plasma process.

反応性パルス化電磁誘導プラズマ法を用いるダイヤモンド様薄膜の蒸着

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Material：
Volume： 66 Issue： 10 Page： 4996-5000 Publication year： Nov. 15, 1989
JST Material Number： C0266A ISSN： 0021-8979 CODEN： JAPIAU Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Thin films of other inorganic compounds

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