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J-GLOBAL ID：200902065694809339   Reference number：90A0157611

Model of plasma immersion ion implantation.

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Author (1)：
LIEBERMAN M A

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(Univ. California, California)

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Material：
Journal of Applied Physics  (Journal of General Physics and its Application to Other Sciences and to Industry)

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Volume： 66  Issue： 7  Page： 2926-2929  Publication year： Oct. 01, 1989 
JST Material Number： C0266A  ISSN： 0021-8979  CODEN： JAPIAU  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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plasma application

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Irradiational changes semiconductors 
(BK16123E)

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