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J-GLOBAL ID:200902070152081596   Reference number:85A0234247

Study of silicon contamination and near-surface damage caused by CF4/H2 reactive ion etching.

CF4/H2反応性イオンエッチングによるシリコンの汚染と表面近傍損傷に関する研究
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Volume: 45  Issue:Page: 420-422  Publication year: Aug. 15, 1984 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Surface structure of semiconductors 

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