Advanced self-alignment process technique with very thick sidewall for high speed GaAs LSIs.

TSUNOTANI M; YAMAMOTO N; KIMURA T; INOKUCHI K; SANO Y

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J-GLOBAL ID：200902080002947850 Reference number：89A0404354

Advanced self-alignment process technique with very thick sidewall for high speed GaAs LSIs.

厚いサイドウォールを持つ高速GaAs LSI用の進んだ自己整合プロセス技術

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Material：
Volume： 1988 Page： 700-703 Publication year： 1988
JST Material Number： C0829B ISSN： 0163-1918 Document type： Proceedings
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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