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J-GLOBAL ID：200902083149886316   Reference number：91A0899105

Model of plasma immersion ion implantation for voltage pulses with finite rise and fall times.

有限立上げおよび下降電圧パルスのプラズマインマージョンイオン注入のモデル
Author (2)：
STEWART R A

About STEWART R A

(Univ. California, California)

About Univ. California, California

, 
LIEBERMAN M A

About LIEBERMAN M A

(Univ. California, California)

About Univ. California, California


Material：
Journal of Applied Physics  (Journal of General Physics and its Application to Other Sciences and to Industry)

About Journal of Applied Physics


Volume： 70  Issue： 7  Page： 3481-3487  Publication year： Oct. 01, 1991 
JST Material Number： C0266A  ISSN： 0021-8979  CODEN： JAPIAU  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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ion implantation

About ion implantation

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Applications of plasma 
(BJ02110K)

About Applications of plasma

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
立上げ

About 立上げ

, 
下降

About 下降

, 
電圧パルス

About 電圧パルス

, 
注入

About 注入

, 
モデル

About モデル


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