Art
J-GLOBAL ID：200902089234585927
Reference number：89A0496957
Plasma source ion implantation: A new approach to ion beam modification of materials.
プラズマ源イオン打込み 材料のイオンビーム改質における新しい方法
-
Publisher site
Copy service
{{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=89A0496957©=1") }}
-
Access JDreamⅢ for advanced search and analysis.
{{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=89A0496957&from=J-GLOBAL&jstjournalNo=D0589B") }}
Author (1)：
Material：
Volume：
116
Page：
197-203
Publication year：
Aug. 15, 1989
JST Material Number：
D0589B
ISSN：
0921-5093
Document type：
Article
Article type：
原著論文
Country of issue：
Netherlands (NLD)
Language：
ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
JST classification (1)：
JST classification
Category name(code) classified by JST.
Irradiational changes in properties and structures in general
Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
,
,
,
Return to Previous Page
