Art
J-GLOBAL ID：200902101500639787   Reference number：99A0479141

Extreme Ultraviolet Lithography.

極端紫外線リソグラフィー
Author (2)：
STULEN R H

About STULEN R H

(Sandia National Lab., CA, USA)

About Sandia National Lab., CA, USA

, 
SWEENEY D W

About SWEENEY D W

(Lawrence Livermore National Lab., CA, USA)

About Lawrence Livermore National Lab., CA, USA


Material：
IEEE Journal of Quantum Electronics  (IEEE J Quantum Electron)

About IEEE Journal of Quantum Electronics


Volume： 35  Issue： 5  Page： 694-699  Publication year： May. 1999 
JST Material Number： H0432A  ISSN： 0018-9197  CODEN： IEJQA7  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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*photolithography

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Manufacturing technology of solid-state devices 
(NC03030V)

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極端紫外線リソグラフィー

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