Art
J-GLOBAL ID:200902102443943268   Reference number:98A0245635

A carbonaceous thin film made by CVD and its application for a carbon/n-type silicon(C/n-Si) photovoltaic cell.

CVDにより作製した炭素質薄膜とその炭素/N形けい素(C/N-Si)光起電力電池への応用
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Material:
Volume: 36  Issue: 1/2  Page: 137-143  Publication year: 1998 
JST Material Number: H0270B  ISSN: 0008-6223  CODEN: CRBNA  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Solar cell 
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