Preparation of TiO<sub>2</sub> Thin Films by Plasma Source Ion Implantation.

HATADA RURIKO; BABA KOMEI

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J-GLOBAL ID：200902104996953957 Reference number：99A1015059

Preparation of TiO₂ Thin Films by Plasma Source Ion Implantation.

プラズマソースイオン注入法によるTiO₂薄膜の作製

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Volume： 50 Issue： 11 Page： 1019-1020 Publication year： Nov. 01, 1999
JST Material Number： G0441B ISSN： 0915-1869 CODEN： HYGIEX Document type： Article
Article type：短報 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Oxide thin films

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BABA, K. Mater. Chem. and Phys. 1998, 54, 135
垰甲博史. 用水と排水. 1996, 38, 290
KATO, K. Thin Solid Films. 1997, 298, 76
BEEMAN, D. Phys. Rev. 1984, B30, 870

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Preparation of TiO2 Thin Films by Plasma Source Ion Implantation.

Preparation of TiO₂ Thin Films by Plasma Source Ion Implantation.