Solid-phase epitaxial growth of CoSi<sub>2</sub> on clean and exygen-adsorbed Si(001) surfaces.

HAYASHI Y; YOSHINAGA M; IKEDA H; ZAIMA S; YASUDA Y

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J-GLOBAL ID：200902107332208056 Reference number：99A0975866

Solid-phase epitaxial growth of CoSi₂ on clean and exygen-adsorbed Si(001) surfaces.

Si(001)の清浄面と酸素吸着面におけるCoSi₂の固相エピタキシャル成長

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Volume： 438 Issue： 1/3 Page： 116-122 Publication year： Sep. 10, 1999
JST Material Number： C0129B ISSN： 0039-6028 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Semiconductor thin films

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Solid-phase epitaxial growth of CoSi2 on clean and exygen-adsorbed Si(001) surfaces.

Solid-phase epitaxial growth of CoSi₂ on clean and exygen-adsorbed Si(001) surfaces.