Art
J-GLOBAL ID:200902107726292400   Reference number:99A0190112

Material properties of heteroepitaxial yttria-stabilized zirconia films with controlled yttria contents on Si prepared by reactive sputtering.

反応性スパッタリングによりSi上にイットリア含有量を制御してヘテロエピタキシャル成長させたイットリア安定化ジルコニア膜の材料特性
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Material:
Volume: 51  Issue:Page: 609-613  Publication year: Dec. 1998 
JST Material Number: E0347A  ISSN: 0042-207X  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Semi thesaurus term:
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Category name(code) classified by JST.
Oxide thin films  ,  Crystal structure of metal oxides and chalcogenides 

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