Art
J-GLOBAL ID：200902108635075900
Reference number：01A0503829
X-Ray Emission Induced by 60 keV High-Flux Copper Negative-Ion Implantation.
60keVの高フラックス銅負イオン注入によって誘起されたX線発生
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Author (5)：
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Material：
Volume：
40
Issue：
2B
Page：
1094-1096
Publication year：
Feb. 28, 2001
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Irradiational changes of other materials
, Luminescence of inorganic compounds
Reference (8)：
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1) J. Ishikawa, H. Tsuji, Y. Toyota, Y. Gotoh, K. Matsuda, T. Tanjo and S. Sasaki: Nucl. Instrum. & Methods <B>B96</B> (1995) 7.
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2) N. Kishimoto, Y. Takeda, N. Umeda, V. T. Gritsyna, C. G. Lee and T. Saito: Nucl. Instrum. & Methods <B>B166-167</B> (2000) 840, and references therein.
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3) T. T. Lay, H. Amekura, Y. Takeda and N. Kishimoto: Mater. Res. Soc. Symp. Proc. 569 (1999) 191.
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4) Y. Mori, A. Takagi, K. Ikegami, A. Ueno and S. Fukumoto: Nucl. Instrum. & Methods <B>B37-38</B> (1989) 63.
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5) J. F. Ziegler, J. P. Biersack and U. Littmark: The Stopping and Range of Ions in Solids (Pergamon Press, New York, 1985).
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Terms in the title (6)：
Terms in the title
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