The Effects of the Preparation Conditions and Heat-Treatment Conditions of Pt/Ti/SiO<sub>2</sub>/Si Substrates on the Nucleation and Growth of Pb(Zr,Ti)O<sub>3</sub> Films.

NAM H-J; KIM H-H; LEE W-J

Art

J-GLOBAL ID：200902109718874703 Reference number：98A0695986

The Effects of the Preparation Conditions and Heat-Treatment Conditions of Pt/Ti/SiO₂/Si Substrates on the Nucleation and Growth of Pb(Zr,Ti)O₃ Films.

Pb(Zr,Ti)O₃膜の核形成と成長に対するPt/Ti/SiO₂/Si基板の作製条件と熱処理条件の影響

Publisher site Copy service {{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=98A0695986&COPY=1") }}
Access JDreamⅢ for advanced search and analysis. {{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=98A0695986&from=J-GLOBAL&jstjournalNo=G0520B") }}

Author (3)： , ,
Material：
Volume： 37 Issue： 6A Page： 3462-3470 Publication year： Jun. 1998
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

,...
,...

To see more with JDream III (charged). {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=98A0695986&from=J-GLOBAL&jstjournalNo=G0520B") }}

Oxide thin films

Reference (13)：

1) S. A. Myers and Leo. N. Chanpin: Mater. Res. Soc. Symp. Proc. 200 (1990) 231.
2) T. Mihara, H. Watanabe and C. A. Araujo: Jpn. J. Appl. Phys. 33 (1994) 5281
3) K. Hirata, N. Hosokawa, T. Hase, T. Sakuma, and Y. Miyasaka: Jpn. J. Appl. Phys. 31 (1992) 3021.
4) T. Hase, T. Sakuma, Y. Miyasaka, K. Hirata and N. Hosokawa: Jpn. J. Appl. Phys. 32 (1993) 4061.
5) S. T. Kim, H. H. Kim, Y. I. Kim, M. Y. Lee and W. J. Lee: Jpn. J. Appl. Phys. 36 (1997) 5663

ｍore...

, , , , , , , , , ,

Return to Previous Page

The Effects of the Preparation Conditions and Heat-Treatment Conditions of Pt/Ti/SiO2/Si Substrates on the Nucleation and Growth of Pb(Zr,Ti)O3 Films.

The Effects of the Preparation Conditions and Heat-Treatment Conditions of Pt/Ti/SiO₂/Si Substrates on the Nucleation and Growth of Pb(Zr,Ti)O₃ Films.