The Effects of the Preparation Conditions and Heat-Treatment Conditions of Pt/Ti/SiO<sub>2</sub>/Si Substrates on the Nucleation and Growth of Pb(Zr,Ti)O<sub>3</sub> Films.

NAM H-J; KIM H-H; LEE W-J

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J-GLOBAL ID：200902109718874703 Reference number：98A0695986

The Effects of the Preparation Conditions and Heat-Treatment Conditions of Pt/Ti/SiO₂/Si Substrates on the Nucleation and Growth of Pb(Zr,Ti)O₃ Films.

Pb(Zr,Ti)O₃膜の核形成と成長に対するPt/Ti/SiO₂/Si基板の作製条件と熱処理条件の影響

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Volume： 37 Issue： 6A Page： 3462-3470 Publication year： Jun. 1998
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Oxide thin films

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The Effects of the Preparation Conditions and Heat-Treatment Conditions of Pt/Ti/SiO2/Si Substrates on the Nucleation and Growth of Pb(Zr,Ti)O3 Films.

The Effects of the Preparation Conditions and Heat-Treatment Conditions of Pt/Ti/SiO₂/Si Substrates on the Nucleation and Growth of Pb(Zr,Ti)O₃ Films.