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J-GLOBAL ID:200902109908586747   Reference number:99A0609755

Study of Resist Pattern Roughness on 0.15 μm KrF Lithography.

0.15μmのKrFリソグラフィーにおけるレジストパターンの粗度に関する研究
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Volume: 12  Issue:Page: 643-648  Publication year: 1999 
JST Material Number: L0202A  ISSN: 0914-9244  CODEN: JSTEEW  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices  ,  Photosensitive materials 
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