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J-GLOBAL ID：200902114939660159
Reference number：00A0908543
Structurally variable cyclopolymers with excellent etch resistance and their application to 193nm lithography.
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Author (4)：
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,
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Material：
Volume：
3999
Issue：
Pt.1
Page：
23-30
Publication year：
2000
JST Material Number：
D0943A
ISSN：
0277-786X
CODEN：
PSISDG
Document type：
Proceedings
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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