Art
J-GLOBAL ID：200902116172287050   Reference number：93A0910063

High rate deposition of alumina films by reactive gas flow sputtering.

反応性ガスフロースパッタリングによるアルミナ膜の高速蒸着
Author (2)：
JUNG T

About JUNG T

(Fraunhofer Inst. Schicht- und Oberflaechentechnik, Hamburg, DEU)

About Fraunhofer Inst. Schicht- und Oberflaechentechnik, Hamburg, DEU

, 
WESTPHAL A

About WESTPHAL A

(Fraunhofer Inst. Schicht- und Oberflaechentechnik, Hamburg, DEU)

About Fraunhofer Inst. Schicht- und Oberflaechentechnik, Hamburg, DEU


Material：
Surface & Coatings Technology  (Surf Coat Technol)

About Surface & Coatings Technology


Volume： 59  Issue： 1/3  Page： 171-176  Publication year： Oct. 01, 1993 
JST Material Number： D0205C  ISSN： 0257-8972  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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reactive sputtering

About reactive sputtering

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Vapor plating 
(WC08022K)

About Vapor plating

,  Ceramic coating to metallic materials 
(YC02050V)

About Ceramic coating to metallic materials

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
反応性ガス

About 反応性ガス

, 
フロー

About フロー

, 
スパッタリング

About スパッタリング

, 
アルミナ膜

About アルミナ膜

, 
蒸着

About 蒸着


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