SiO<sub>X</sub> Thin Film Deposition Using a Hollow Cathode Plasma Source.

OKIMOTO TADAO; KUMAKIRI TADASHI; TAMAGAKI HIROSHI

Art

J-GLOBAL ID：200902118918917740 Reference number：02A0753011

SiO_X Thin Film Deposition Using a Hollow Cathode Plasma Source.

ホローカソードプラズマ源によるSiO_X成膜

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Author (3)： , ,
Material：
Volume： 52 Issue： 2 Page： 27-30 Publication year： Sep. 01, 2002
JST Material Number： F0164A ISSN： 0373-8868 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Techniques and equipment of thin film deposition

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SiOX Thin Film Deposition Using a Hollow Cathode Plasma Source.

SiO_X Thin Film Deposition Using a Hollow Cathode Plasma Source.