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J-GLOBAL ID:200902118918917740   Reference number:02A0753011

SiOX Thin Film Deposition Using a Hollow Cathode Plasma Source.

ホローカソードプラズマ源によるSiOX成膜
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Volume: 52  Issue:Page: 27-30  Publication year: Sep. 01, 2002 
JST Material Number: F0164A  ISSN: 0373-8868  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Techniques and equipment of thin film deposition 
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