Art
J-GLOBAL ID：200902125067185144
Reference number：01A0739941
Thermal Uniformity of 12-in Silicon Wafer During Rapid Thermal Processing by Inverse Heat Transfer Method.
逆熱伝達法による急速熱プロセシング時の12インチシリコンウエハの熱的均一性
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Author (2)：
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Material：
Volume：
13
Issue：
4
Page：
448-456
Publication year：
Nov. 2000
JST Material Number：
T0521A
ISSN：
0894-6507
CODEN：
ITSMED
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices
Terms in the title (5)：
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