Art

J-GLOBAL ID：200902132092515287   Reference number：01A0156997

Overlay compatibility between two synchroton radiation steppers.

二つのシンクロトロン放射ステッパ間のオーバレイ適合性

Author (8)： FUKUDA M (NTT Telecommunications Energy Lab., Kanagawa Prefecture, JPN) ,  SUZUKI M (NTT Telecommunications Energy Lab., Kanagawa Prefecture, JPN) ,  HAGA T (NTT Telecommunications Energy Lab., Kanagawa Prefecture, JPN) ,  MORITA H (NTT Telecommunications Energy Lab., Kanagawa Prefecture, JPN) ,  AOYAMA H (ASET Super-fine SR Lithography Lab., Kanagawa Prefecture, JPN) ,  MITSUI S (ASET Super-fine SR Lithography Lab., Kanagawa Prefecture, JPN) ,  TAGUCHI T (ASET Super-fine SR Lithography Lab., Kanagawa Prefecture, JPN) ,  MATSUI Y (ASET Super-fine SR Lithography Lab., Kanagawa Prefecture, JPN)
Material： Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures  (Journal of Vacuum Science & Technology. B. Microelectronics Processing and Phenomena)
Volume： 18  Issue： 6  Page： 2995-2998  Publication year： Nov. 2000 
JST Material Number： E0974A  ISSN： 1071-1023  CODEN： JVTBD9  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： *X ray lithography ,...

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JST classification (2)： X-ray instruments and techniques  (BA02060D) ,  Manufacturing technology of solid-state devices  (NC03030V)

Terms in the title (4)： シンクロトロン放射 ,  ステッパ ,  オーバレイ ,  適合性