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J-GLOBAL ID:200902135399659218   Reference number:02A0698066

Electrical Properties of HfO2 Thin Insulating Film Prepared by Anodic Oxidation.

陽極酸化により作製したHfO2絶縁薄膜の電気的性質
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Volume: 41  Issue:Page: 5284-5287  Publication year: Aug. 15, 2002 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Ferroelectrics,antiferroelectrics and ferroelasticity  ,  Oxide thin films  ,  Metal-insulator-metal structures 
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