Ion-beam stimulated solid-phase crystallization of amorphous Si on SiO<sub>2</sub>.

MIYAO M; TSUNODA I; SADOH T; KENJO A

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J-GLOBAL ID：200902135851435365 Reference number：01A0398241

Ion-beam stimulated solid-phase crystallization of amorphous Si on SiO₂.

SiO₂上の非晶質Siのイオンビーム刺激固相結晶化

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Author (4)： , , ,
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Volume： 383 Issue： 1/2 Page： 104-106 Publication year： Feb. 15, 2001
JST Material Number： B0899A ISSN： 0040-6090 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Semiconductor thin films , Irradiational changes semiconductors

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Ion-beam stimulated solid-phase crystallization of amorphous Si on SiO2.

Ion-beam stimulated solid-phase crystallization of amorphous Si on SiO₂.