Art
J-GLOBAL ID：200902137447029399   Reference number：96A0260446

Micro-Raman spectroscopy to study local mechanical stress in silicon integrated circuits.

顕微Raman分光法によるシリコン集積回路の局所応力の研究
Author (1)：
DE WOLF I

About DE WOLF I

(Interuniv. Micro-Electronics Center(IMEC), Leuven, BEL)

About Interuniv. Micro-Electronics Center(IMEC), Leuven, BEL


Material：
Semiconductor Science and Technology  (Semicond Sci Technol)

About Semiconductor Science and Technology


Volume： 11  Issue： 2  Page： 139-154  Publication year： Feb. 1996 
JST Material Number： E0503B  ISSN： 0268-1242  CODEN： SSTEET  Document type： Article
Article type： 文献レビュー  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
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Raman spectroscopy

About Raman spectroscopy

,...
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JST classification (1)：
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Measurement,testing and reliability of solid-state devices 
(NC03040G)

About Measurement,testing and reliability of solid-state devices

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
顕微Raman分光法

About 顕微Raman分光法

, 
シリコン

About シリコン

, 
集積回路

About 集積回路

, 
局所応力

About 局所応力

, 
研究

About 研究


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