Art
J-GLOBAL ID：200902137622659970   Reference number：01A0283002

Electrical and optical properties of InN films prepared by reactive sputtering.

反応性スパッタリングにより作製したInN膜の電気及び光学特性
Author (2)：
SAITO N

About SAITO N

(Takamatsu National Coll. Technol., Takamatsu, JPN)

About Takamatsu National Coll. Technol., Takamatsu, JPN

, 
IGASAKI Y

About IGASAKI Y

(Shizuoka Univ., Hamamatsu, JPN)

About Shizuoka Univ., Hamamatsu, JPN


Material：
Applied Surface Science  (Appl Surf Sci)

About Applied Surface Science


Volume： 169/170  Page： 349-352  Publication year： Jan. 15, 2001 
JST Material Number： B0707B  ISSN： 0169-4332  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*wurtzite type crystal

About wurtzite type crystal

,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=01A0283002&from=J-GLOBAL&jstjournalNo=B0707B") }}
JST classification (3)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films 
(BK14040E)

About Semiconductor thin films

,  Electric conduction in crystalline semiconductors 
(BM03043X)

About Electric conduction in crystalline semiconductors

,  Optical properties of condensed matter in general 
(BM08010A)

About Optical properties of condensed matter in general

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
反応性スパッタリング

About 反応性スパッタリング

, 
作製

About 作製

, 
InN

About InN

, 
光学特性

About 光学特性


Return to Previous Page

TOP

BOTTOM