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J-GLOBAL ID:200902139828307886   Reference number:96A0902396

Pattern Formation of Sputtered Films by Deposition through Mask.

マスクを通した蒸着によるスパッタ膜のパターン形成
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Volume: 35  Issue: 9A  Page: 4755-4759  Publication year: Sep. 1996 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices  ,  Metallic thin films 
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