Pattern Formation of Sputtered Films by Deposition through Mask.

YAMAZAKI T; YOSHINO Y; YOSHIZAWA T; YAMABUCHI T; TERAYAMA K; SHIMAZAKI T; MIZUGUCHI T

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Pattern Formation of Sputtered Films by Deposition through Mask.

マスクを通した蒸着によるスパッタ膜のパターン形成

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Author (7)： , , , , , ,
Material：
Volume： 35 Issue： 9A Page： 4755-4759 Publication year： Sep. 1996
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Metallic thin films

Reference (14)：

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HANAK, J. J. J.Appl.Phys. 1972, 43, 1666
SWAN, S. Vacuum. 1988, 38, 791
TODOROVA, S. Vacuum. 1988, 38, 869
TAKAHASHI, M. Oyo Buturi. 1985, 54, 242

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