Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Laser Resist.

TAKECHI S; TAKAHASHI M; KOTACHI A; NOZAKI K; YANO E; HANYU I

Art

J-GLOBAL ID：200902139957882927 Reference number：96A0613993

Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Laser Resist.

193nm単層レジストに用いられる2-メチル-2-アダマンチル基の効力

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Material：
Volume： 9 Issue： 3 Page： 475-487 Publication year： 1996
JST Material Number： L0202A ISSN： 0914-9244 CODEN： JSTEEW Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Other reactions of polymer , Acrylic resins , Manufacturing technology of solid-state devices

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