Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Laser Resist.

TAKECHI S; TAKAHASHI M; KOTACHI A; NOZAKI K; YANO E; HANYU I

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J-GLOBAL ID：200902139957882927 Reference number：96A0613993

Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Laser Resist.

193nm単層レジストに用いられる2-メチル-2-アダマンチル基の効力

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Material：
Volume： 9 Issue： 3 Page： 475-487 Publication year： 1996
JST Material Number： L0202A ISSN： 0914-9244 CODEN： JSTEEW Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Other reactions of polymer , Acrylic resins , Manufacturing technology of solid-state devices

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Reference (7)：

1). Y. Kaimoto, K. Nozaki, S. Takechi, and N. Abe, Proc.SPIE, 1672,66(1992)
2). S. Takechi, Y. Kaimoto, K. Nozaki, and N. Abe, J. Photopolym. Sci. Technol., 5(3), 439(1992)
3). M. Takahashi, S. Takechi, K. Nozaki, Y. Kaimoto, and N. Abe, J. Photopolym. Sci. Technol., 7(1), 3 1(1994)
4). M. Takahashi, S. Takechi, Y. Kaimoto, K. Nozaki, and N. Abe, Proc. SPIE, 2438, 422 (1995)
5). S. Takechi, M. Takahashi, and I. Hanyu, INTERFACE'95 p43 (1995)

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