Art
J-GLOBAL ID：200902140592408455   Reference number：93A0798257

Fabrication of high aspect ratio silicon pillars of <10 nm diameter.

直径<10nmの大きなアスペクト比をもつシリコン柱の作製
Author (2)：
CHEN W

About CHEN W

(Univ. Cambridge, Cambridge, GBR)

About Univ. Cambridge, Cambridge, GBR

, 
AHMED H

About AHMED H

(Univ. Cambridge, Cambridge, GBR)

About Univ. Cambridge, Cambridge, GBR


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 63  Issue： 8  Page： 1116-1118  Publication year： Aug. 23, 1993 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
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silicon

About silicon

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Applications of electron beams and ion beams 
(BD02070X)

About Applications of electron beams and ion beams

,  Luminescence of semiconductors 
(BM08092S)

About Luminescence of semiconductors

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
直径

About 直径

, 
アスペクト比

About アスペクト比

, 
シリコン

About シリコン

, 
作製

About 作製


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