Art
J-GLOBAL ID：200902141591270081   Reference number：99A0074542

The Beam Size Control Method of the Electron Beam Direct Writing Lithography.

電子ビーム露光におけるビーム寸法制御法
Author (2)：
KOIKE KAORU

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(ソニー)

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, 
MORIYA SHIGERU

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(ソニー)

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Material：
電気学会光応用・視覚研究会資料  (電気学会研究会資料)

About 電気学会光応用・視覚研究会資料


Volume： LAV-98  Issue： 1-6  Page： 25-29  Publication year： Nov. 20, 1998 
JST Material Number： Z0953A  Document type： Proceedings
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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*electron beam lithography

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,...
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Thesaurus term/Semi thesaurus term
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dimensional control

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Manufacturing technology of solid-state devices 
(NC03030V)

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電子ビーム露光

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, 
ビーム

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, 
寸法制御

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