Art
J-GLOBAL ID：200902142532138290   Reference number：99A0369562

Low dielectric constant films prepared by plasma-enhanced chemical vapor deposition from tetramethylsilane.

テトラメチルシランからのプラズマ支援化学気相蒸着による低誘電率膜
Author (2)：
GRILL A

About GRILL A

(IBM-Res. Div., New York)

About IBM-Res. Div., New York

, 
PATEL V

About PATEL V

(IBM-Res. Div., New York)

About IBM-Res. Div., New York


Material：
Journal of Applied Physics  (Journal of General Physics and its Application to Other Sciences and to Industry)

About Journal of Applied Physics


Volume： 85  Issue： 6  Page： 3314-3318  Publication year： Mar. 15, 1999 
JST Material Number： C0266A  ISSN： 0021-8979  CODEN： JAPIAU  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*dielectric material

About dielectric material

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
pressure dependence

About pressure dependence


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JST classification (2)：
JST classification
Category name(code) classified by JST.
Dielectrics in general 
(BM05010F)

About Dielectrics in general

,  Oxide thin films 
(BK14050P)

About Oxide thin films

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
テトラメチルシラン

About テトラメチルシラン

, 
プラズマ支援化学気相蒸着

About プラズマ支援化学気相蒸着

, 
低誘電率膜

About 低誘電率膜


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