Art
J-GLOBAL ID：200902143884730578
Reference number：02A0642893
Photoresist Removal using Atomic Hydrogen Generated by Heated Catalyzer.
加熱触媒により生じた原子状水素を用いたフォトレジスト除去
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Author (2)：
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Material：
Volume：
41
Issue：
7A
Page：
4639-4641
Publication year：
Jul. 15, 2002
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices
Reference (15)：
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BURKMAN, D. Semicond. Int. 1981, 4, 103
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SATO, S. J. Vac. Sci. & Technol. A. 1991, 9, 2696
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MATSUMURA, M. Proc. VLSI Multilevel Interconnect Conf. 1993, 113
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PANKOVE, J. I. Hydrogen in Semiconductors. 1991
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PANKOVE, J. I. Semiconductors and Semimetals. 1991, 34
ｍore...
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