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J-GLOBAL ID:200902144813533824   Reference number:98A0671922

Photo Alignment Materials with High Sensitivity to Near UV Light.

近UV光に対する感度の大きい光配向性材料
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Material:
Volume: 11  Issue:Page: 187-192  Publication year: 1998 
JST Material Number: L0202A  ISSN: 0914-9244  CODEN: JSTEEW  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Structure and morphology of polymer solids  ,  Liquid crystals in general 
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Reference (9):
  • 1). M.Hasegawa and Y.Taira, Proc. IRDC. 94(1994)p213.
  • 2). W.Gibbons, P.Shannon, S.Sun and B.Swetlin. Nature, 351(1991)49.
  • 3). M.Schadt, K.Schmitt, V.hozinkov and V.Chifrinnov, Jpn. J. Appl. Phys., 31(1992)2155.
  • 4). Y.Iimura, T.Satoh and S.Kobayashi, J. Photopolym. Sci. Teclnol., 8(1995)257.
  • 5). K.Y.Han. B.H.Chae, S.H.Yu. J.G.Park. D.Y.Kim. S.T.Shin and Y.K.Joo, IDW'96 Proceedings of The Third International Display Workshops, 1(1996)p403.
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