Art
J-GLOBAL ID：200902145573132203   Reference number：96A0800855

Fabrication of arrays of large step-free regions on Si(001).

Si(001)上の大きいステップフリー領域の配列の加工
Author (5)：
TANAKA S

About TANAKA S

(Cornell Univ., New York)

About Cornell Univ., New York

, 
UMBACH C C

About UMBACH C C

(Cornell Univ., New York)

About Cornell Univ., New York

, 
BLAKELY J M

About BLAKELY J M

(Cornell Univ., New York)

About Cornell Univ., New York

, 
TROMP R M

About TROMP R M

(IBM Watson Res. Lab., New York)

About IBM Watson Res. Lab., New York

, 
MANKOS M

About MANKOS M

(IBM Watson Res. Lab., New York)

About IBM Watson Res. Lab., New York


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 69  Issue： 9  Page： 1235-1237  Publication year： Aug. 26, 1996 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
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silicon

About silicon

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Surface structure of semiconductors 
(BK15030A)

About Surface structure of semiconductors

,  Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

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Si

About Si


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