Solid-phase crystallization of amorphous SiGe films deposited by LPCVD on SiO<sub>2</sub> and glass.

OLIVARES J; RODRIGUEZ A; SANGRADOR J; RODRIGUEZ T; BALLESTEROS C; KLING A

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J-GLOBAL ID：200902145902729593 Reference number：99A0297053

Solid-phase crystallization of amorphous SiGe films deposited by LPCVD on SiO₂ and glass.

SiO₂またはガラス基板にLPCVD蒸着させた非晶質SiGe膜の固相結晶化

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Author (6)： , , , , ,
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Volume： 337 Issue： 1/2 Page： 51-54 Publication year： Jan. 11, 1999
JST Material Number： B0899A ISSN： 0040-6090 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Semiconductor thin films

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Solid-phase crystallization of amorphous SiGe films deposited by LPCVD on SiO2 and glass.

Solid-phase crystallization of amorphous SiGe films deposited by LPCVD on SiO₂ and glass.