Art
J-GLOBAL ID：200902146003338041   Reference number：01A0835760

Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition.

プラズマ増強化学蒸着により作製した超低k誘電体
Author (2)：
GRILL A

About GRILL A

(IBM Res. Div., New York)

About IBM Res. Div., New York

, 
PATEL V

About PATEL V

(IBM Res. Div., New York)

About IBM Res. Div., New York


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 79  Issue： 6  Page： 803-805  Publication year： Aug. 06, 2001 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
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*plasma CVD

About plasma CVD

,...
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JST classification (1)：
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Thin films of other inorganic compounds 
(BK14060A)

About Thin films of other inorganic compounds

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
プラズマ増強化学蒸着

About プラズマ増強化学蒸着

, 
作製

About 作製

, 
低k誘電体

About 低k誘電体


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