Art
J-GLOBAL ID：200902147672379710   Reference number：93A0424281

A simple model for the formation of compressive stress in thin films by ion bombardment.

イオン衝撃による薄膜中の圧縮応力の形成に対する簡単な模型
Author (1)：
DAVIS C A

About DAVIS C A

(Univ. Sydney, NSW, AUS)

About Univ. Sydney, NSW, AUS


Material：
Thin Solid Films

About Thin Solid Films


Volume： 226  Issue： 1  Page： 30-34  Publication year： Apr. 15, 1993 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
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thin film growth

About thin film growth

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
イオンビーム支援蒸着

About イオンビーム支援蒸着


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JST classification (3)：
JST classification
Category name(code) classified by JST.
Thin films in general 
(BK14010X)

About Thin films in general

,  Irradiational changes in properties and structures in general 
(BK16121W)

About Irradiational changes in properties and structures in general

,  Mechanical properties of solids in general 
(BL01021C)

About Mechanical properties of solids in general

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
イオン衝撃

About イオン衝撃

, 
薄膜

About 薄膜

, 
圧縮応力

About 圧縮応力

, 
模型

About 模型


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