Art
J-GLOBAL ID：200902148456580938   Reference number：96A0328679

Chemically Amplified Electron-Beam Photoresists.

化学的に増幅された電子ビームフォトレジスト
Author (2)：
CRIVELLO J V

About CRIVELLO J V

(Rensselaer Polytechnic Inst., New York)

About Rensselaer Polytechnic Inst., New York

, 
SHIM S-Y

About SHIM S-Y

(Rensselaer Polytechnic Inst., New York)

About Rensselaer Polytechnic Inst., New York


Material：
Chemistry of Materials  (Chem Mater)

About Chemistry of Materials


Volume： 8  Issue： 2  Page： 376-381  Publication year： Feb. 1996 
JST Material Number： T0893A  ISSN： 0897-4756  CODEN： CMATEX  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
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photoresist

About photoresist

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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bridged compound

About bridged compound

,...
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JST classification (3)：
JST classification
Category name(code) classified by JST.
Physical properties of polymer solids 
(CG02024U)

About Physical properties of polymer solids

,  Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

,  Photochemical reaction,radical reaction 
(CF02090A)

About Photochemical reaction,radical reaction

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
化学

About 化学

, 
増幅

About 増幅

, 
電子ビーム

About 電子ビーム

, 
フォトレジスト

About フォトレジスト


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